Influence of the pvd process parameters on zno: al thin films

SCImago Journal Rank
2024: SJR=0.300

CWTS Journal Indicators
2024: SNIP=0.77

Vol.2, No.1, 2017: pp.1-5

INFLUENCE OF THE PVD PROCESS PARAMETERS ON ZNO: AL THIN FILMS

Authors:

Paulina Boryło¹

, Krzysztof Matus¹, Krzysztof Lukaszkowicz¹, Marek Szindler¹,

Klaudiusz Gołombek¹

¹Institute of Engineering Materials and Biomaterials, Silesian University of Technology, Konarskiego 18A, 44-100 Gliwice, Poland

Received: 23 February 2017
Accepted: 18 March 2017
Available: 30 March 2017

Abstract:

In recent years a growing interest in searching new material for producing Transparent Conductive Layers (TLC) is observed. ZnO:Al thin films are this type material, interesting due to wide range of potential applications where it can be applied like: transparent electrodes, gas sensors, thin film transistors, sensor devices, electroluminescent diodes and others.
The aim of this paper is to discuss influence of the ZnO:Al film deposition parameters of PVD magnetron sputtering method on TCL structure and its chemical composition. It contains description of the ZnO:Al PVD magnetron sputtering deposition method. It discusses results obtained from the analysis of the microstructure of ZnO:Al thin films using a high resolution scanning electron microscope, layers’ surface topography determined with atomic force microscope and results of chemical composition analyses.

Keywords:

TCL, MZO, PVD, ZnO:Al, SEM, AFM

References:

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This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License (CC BY-NC 4.0)

Volume 10
Number 1
March 2025

Influence of the pvd process parameters on zno: Al thin films

How to Cite

P. Boryło, K. Matus, K. Lukaszkowicz, M. Szindler, K. Gołombek, Influence of the PVD Process Parameters on ZnO: Al Thin Films. Applied Engineering Letters, 2(1), 2017: 1-5.

More Citation Formats

APA

Boryło, P., Matus, K., Lukaszkowicz, K., Szindler, M., & Gołombek, K. (2017). Influence of the PVD Process Parameters on ZnO: Al Thin Films. Applied Engineering Letters, 2(1), 1-5.

MLA

Boryło, Paulina, et al. “Influence of the PVD Process Parameters on ZnO: Al Thin Films.“ Applied Engineering Letters, vol. 2, no. 1, 2017, pp. 1-5.

Chicago

Boryło, Paulina, Krzysztof Matus, Krzysztof Lukaszkowicz, Marek Szindler, and Klaudiusz Gołombek. 2017. “Influence of the PVD Process Parameters on ZnO: Al Thin Films.“ Applied Engineering Letters, 2 (1): 1-5.

Harvard

Boryło, P., Matus, K., Lukaszkowicz, K., Szindler, M. and Gołombek, K. (2017). Influence of the PVD Process Parameters on ZnO: Al Thin Films. Applied Engineering Letters, 2(1), pp. 1-5.